The objective of this course is to provide the student with the necessary background to select an appropriate method for the preparation of a thin film by vacuum technique, to implement it, and to understand the underlying physical mechanisms. The content includes discussion of nucleation and synthesis of thin films deposited by vacuum techniques: evaporation, plasma, ...
The content is tailored to the needs of the students for their Master thesis. For example, it may include: Review of the kinetic theory of gases. Evaporation: Knudsen model, types of evaporators, technical considerations. Measurement of the thickness of a thin film. Epitaxial growth, growth modes, stresses and strains, critical thickness. Molecular beam epitaxy (principle, real time and post characterisation, epitaxy on silicon) Basic introduction to CVD DC and RF sputtering, plasma diagnostic techniques, numerical simulation of thin film growth.
Personal work, relating to a topic developed in the course. The work must demonstrate a thorough understanding of the topic.
The scientific literature in the field.